AVS International Symposium and Exhibition
November 5 - November 10
ACT will be presenting at the AVS 69th International Symposium & Exhibition. The theme for this year’s Symposium is “Two is Better than One: Breaking Barriers with Coupled Phenomena.” The theme is intended to highlight the recent and emerging interest throughout AVS in engineering materials and devices with novel, multifaceted functionality in small or complex form factors.
Mruthunjaya Uddi, Yue Xiao, Devon Jensen, Chien-Hua Chen, et al. will be presenting In-Situ Laser Diagnostics of Plasma Surface Interactions by fs-TALIF.